Until EUV lithography becomes a reality, multiple patterning technologies such as triple litho-etch (LELELE), self-aligned double patterning (SADP), and self-aligned quadruple patterning (SAQP) are ...
We first developed a virtual device structure to test how ALD thickness affects hole size uniformity and CD. We started our virtual experiment by using two crisscross SAQP processes and transferring a ...
The Nature Index 2025 Research Leaders — previously known as Annual Tables — reveal the leading institutions and countries/territories in the natural and health sciences, according to their output in ...
If a lot of the buzz at SPIE last week came from the packed sessions on EUV technology, a lot of the serious note-taking was done at the papers on double-patterning. Not least among the sources of ...
August 26, 2014. Today, KLA-Tencor Corp. introduced the WaferSight PWG patterned wafer geometry measurement system, the LMS IPRO6 reticle pattern placement metrology system and the K-T Analyzer 9.0 ...
Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...
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