Patterns created using advanced fault models provide higher test coverage, improved defect detection, and higher-yielding ...
Research and innovation hub imec has produced patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands.
Structured software is based on a plan that considers the specific requirements of a system and translates them into loosely coupled components. In collaborative software development, development ...
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